Search from the table of contents of 2.5 million books
Advanced Search (Beta)
Home > The Physics and Chemistry of SiO2 and the Si-SiO2 Interface 2 > Reoxidized Nitrided Oxide Gate Dielectrics for Advanced CMOS
The Physics and Chemistry of SiO2 and the Si-SiO2 Interface 2 |
B.E. Deal; C.R. Helms
Springer US
The Physics and Chemistry of SiO2 and the Si-SiO2 Interface 2
Reoxidized Nitrided Oxide Gate Dielectrics for Advanced CMOS
Authors

Peter W. Wyatt; Gregory J. Dunn

ARI Id

1664228600167_843078

Access

Not Available Free

Pages

319-328

DOI

10.1007/978-1-4899-1588-7_34

Chapter URL

https://rd.springer.com/chapter/10.1007/978-1-4899-1588-7_34

Table of Contents of Book
Showing 1 to 20 of 64 entries
Chapters/HeadingsAuthor(s)PagesInfo
Front Matter
i-xvi
Front Matter
1-2
Silicon Oxides and Oxidation
A. Marshall Stoneham
3-6
Use of 18O Labelling to Study Growth Mechanisms in Dry Oxidation of Silicon
Isabelle Trimaille; Stan I. Raider; Jean-Jacques Ganem; Serge Rigo; Nicholas A. Penebre
7-13
Strain Dependent Diffusion During Dry Thermal Oxidation of Crystalline Si
C. H. Bjorkman; G. Lucovsky
15-21
Oxidation of Silicon in Oxygen: Measurement of Film Thickness and Kinetics
S. C. Kao; R. H. Doremus
23-30
Modeling Process-Dependent Thermal Silicon Dioxide (SiO2) Films on Silicon
H. F. Wei; A. K. Henning; J. Slinkman; J. L. Rogers
31-41
Front Matter
43-44
New Approach to Chemically Enhanced Oxidation — A Review
Ralph J. Jaccodine
45-54
Kinetics of Oxidation of Silicon by Electron Cyclotron Resonance Plasmas
J. Joseph; Y. Z. Hu; E. A. Irene
55-62
Mechanisms of Oxidation Rate Enhancement in Negative-Point Oxygen Corona Discharge Processing of SiO2 Films on Si
L. M. Landsberger
63-70
High Pressure Oxidation for Low Temperature Passivation of Si1-xGex Alloys
C. Caragianis; Y. Shigesato; D. C. Paine
71-79
A New Ellipsometry Technique for Interface Analysis: Application to Si-SiO2
E. A. Irene; V. A. Yakovlev
81-90
Observation of Thin SiO2 Films Using IR-RAS
Shuzo Fujimura; Kenji Ishikawa; Haruhisa Mori
91-98
Deconvolution of Thickness-Averaged Structural and Optical Properties of Thermally Grown and Rpecvd SiO2 Films
C. E. Shearon Jr.; C. H. Bjorkman; G. Lucovsky
99-108
Tem Investigations of the Oxidation Kinetics of Amorphous Silicon Films
Manfred Reiche
109-116
Front Matter
117-118
Thermal and X-Ray Production of Point Defects in Vitreous SiO2
Frank L. Galeener
119-129
A Review of the EPR Spectroscopy of the Point Defects in α-Quartz: The Decade 1982–1992
John A. Weil
131-144
Formation of Si/SiO2 Heterostructures by Low-Temperature, Plasma-Assisted Oxidation and Deposition Processes
G. Lucovsky; Yi Ma; T. Yasuda; S. Habermehl
145-156
Chapters/HeadingsAuthor(s)PagesInfo
Showing 1 to 20 of 64 entries
Similar Books
Similar Chapters
Similar Thesis

Similar News

Similar Articles
Similar Article Headings