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Home > Electron Microbeam Analysis > An Electron Spectroscopy Study of a-SiNx Films
Electron Microbeam Analysis |
Abraham Boekestein; Miodrag K. Pavicevic
Springer Vienna
Electron Microbeam Analysis
An Electron Spectroscopy Study of a-SiNx Films
Authors

Alexander G. Fitzgerald; Heather L. L. Watton; Mervin J. Rose

ARI Id

1664279161292_1040493

Access

Not Available Free

Pages

235-239

DOI

10.1007/978-3-7091-6679-6_25

Chapter URL

https://rd.springer.com/chapter/10.1007/978-3-7091-6679-6_25

Table of Contents of Book
Showing 1 to 20 of 32 entries
Chapters/HeadingsAuthor(s)PagesInfo
Front Matter
I-IX
EPMA—A Versatile Technique for the Characterization of Thin Films and Layered Structures
Peter Willich
1-17
Quantitative EPMA of the Ultra-Light Elements Boron Through Oxygen
Guillaume F. Bastin; Hans J. M. Heijligers
19-36
Auger Microscopy and Electron Probe Microanalysis
J. Cazaux
37-52
Quantitative X-Ray Microanalysis of Ultra-Thin Resin-Embedded Biological Samples
Hugh Y. Elder; Stuart M. Wilson; W. A. Patrick Nicholson; John D. Pediani; Scott A. McWilliams; D. McEwan Jenkinson et al.
53-74
Analytical and High-Resolution Electron Microscopy Studies at Metal/Ceramic Interfaces
Manfred Rühle
75-92
Quantitative Electron Probe Microanalysis of Multi-layer Structures
Guillaume F. Bastin; Johannes M. Dijkstra; Hans J. M. Heijligers; Dick Klepper
93-97
Comparison of Φ (ρz) Curve Models in EPMA
José A. Riveros; Gustavo E. Castellano; Jorge C. Trincavelli
99-105
Quantitative Electron Probe Microanalysis: New Accurate Φ (ρz) Description
Claude Merlet
107-115
A Modular Universal Correction Procedure for Quantitative EPMA
Ian Farthing; Glyn Love; Victor D. Scott; Clive T. Walker
117-124
Monte Carlo Simulation of Backscattered and Secondary Electron Profiles
Christian Eisenschmidt; Ulf Werner
125-129
An Electron Scattering Model Applied to the Determination of Film Thicknesses Using Electron Probe Microanalysis
Hans-Jürgen August
131-137
Calculation of Depth Distribution Functions for Characteristic and for Continuous Radiation
Hans-Jürgen August
139-146
A Method for In-Situ Calibration of Semiconductor Detectors
Johann Wernisch; Angela Schönthaler; Hans-Jürgen August
147-152
Background Anomalies in Electron Probe Microanalysis Caused by Total Reflection
Werner P. Rehbach; Peter Karduck
153-160
Automatic Analysis of Soft X-Ray Emission Spectra Obtained by EPMA
Ifan A. Slavic; Jasna I. Slavic; Ivan A. Grzetic; Miodrag K. Pavicevic
161-171
The Scanning Very-Low-Energy Electron Microscope (SVLEEM)
Ilona Müllerová; Michal Lenc
173-177
To the Backscattering Contrast in Scanning Auger Microscopy
Luděk Frank
179-186
Design Consideration Regarding the Use of an Accelerator Mass Spectrometer in Ion Microanalysis
K. M. Subotic; Miodrag K. Pavicevic
187-190
Accurate Estimation of Uncertainties in Quantitative Electron Energy-Loss Spectrometry
Jan J. Y. Van Puymbroeck; Wim A. Jacob; Pierre J. M. Van Espen
191-195
Chapters/HeadingsAuthor(s)PagesInfo
Showing 1 to 20 of 32 entries
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