Chapter: Diffusion and Deactivation of As in Si: Combining Atomistic and Continuum Simulation Approaches

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Home > Simulation of Semiconductor Processes and Devices 2007: SISPAD 2007 > Diffusion and Deactivation of As in Si: Combining Atomistic and Continuum Simulation Approaches

Simulation of Semiconductor Processes and Devices 2007: SISPAD 2007 |

Tibor Grasser; Siegfried Selberherr

Springer Vienna

Simulation of Semiconductor Processes and Devices 2007: SISPAD 2007

Diffusion and Deactivation of As in Si: Combining Atomistic and Continuum Simulation Approaches

Chapter Info

Authors

A. Martinez-Limia; C. Steen; P. Pichler; N. Gupta; W. Windl; S. Paul et al.

ARI Id

1664319009609_1194227

Access

Not Available Free

Pages

13-16

DOI

10.1007/978-3-211-72861-1_3

Chapter URL

https://rd.springer.com/chapter/10.1007/978-3-211-72861-1_3

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