Chapter: Multiscale modeling methods

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Home > Handbook of Silicon Based MEMS Materials and Technologies (Third Edition) > Multiscale modeling methods

Handbook of Silicon Based MEMS Materials and Technologies (Third Edition) |

Horst Theuss; Markku Tilli; Matthias Petzold; Mervi Paulasto-Krockel; Teruaki Motooka andVeikko Lindroos

Elsevier

Handbook of Silicon Based MEMS Materials and Technologies (Third Edition)

Multiscale modeling methods

Chapter Info

Authors

Teruaki Motooka; Tsuyoshi Uda

ARI Id

1665425175421_16755968

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Not Available Free

Pages

249-261

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Chapters/Headings	Author(s)	Pages	Info
Silicon as MEMS Material
Properties of silicon	Markku Tilli; Atte Haapalinna	3-17
Czochralski growth of silicon crystals	Olli Anttila	19-60
Properties of silicon crystals	Jari Paloheimo	61-92
Silicon wafers preparation and properties	Markku Tilli	93-110
Epi wafers: preparation and properties	Doug Meyer	111-131
Thin films on silicon		133-213
Thick-film silicon-on-insulator wafers preparation and properties	Jari Mäkinen; Tommi Suni	215-246
Modeling in MEMS
Multiscale modeling methods	Teruaki Motooka; Tsuyoshi Uda	249-261
Mechanical properties of silicon microstructures	Maria Ganchenkova; Risto M. Nieminen	263-303
Electrostatic and RF-properties of MEMS structures	Ilkka Tittonen; Mika Koskenvuori	305-324
Optical modeling of MEMS	Timo Aalto; Juuso Olkkonen	325-344
Modeling of silicon etching	Miguel A. Gosálvez	345-365
Gas damping in vibrating MEMS structures	Timo Veijola	367-386
Recent progress in large-scale electronic state calculations and data-driven sciences	Takeo Hoshi; Satoshi Itoh	387-396
Micromachining Technologies in MEMS
MEMS lithography	Sami Franssila; Santeri Tuomikoski	399-416
Deep reactive ion etching	Franz Laermer; Sami Franssila; Lauri Sainiemi; Kai Kolari	417-446
Wet etching of silicon	Miguel A. Gosálvez; I. Zubel; Eeva Viinikka	447-480
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