Chapter: Microfluidics: technologies and applications

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Home > Nanolithography > Microfluidics: technologies and applications

Nanolithography |

M. Feldman

Woodhead Publishing

Microfluidics: technologies and applications

Chapter Info

Authors

L. Jiang; N.S. Korivi

ARI Id

1665493972940_17005866

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Not Available Free

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Chapters/Headings	Author(s)	Pages	Info
Optical projection lithography	B.W. Smith
Extreme ultraviolet (EUV) lithography	B.J. Rice
Electron beam lithography	T.R. Groves
Focused ion beams for nano-machining and imaging	M. Utlaut
Masks for micro- and nanolithography	E. Gallagher; M. Hibbs
Maskless photolithography	M.E. Walsh; F. Zhang; R. Menon; H.I. Smith
Chemistry and processing of resists for nanolithography	A. Novembre; S. Liu
Directed assembly nanolithography	S. Matsui; M. Takenaka; H. Yoshida
Nanoimprint lithography	D. Resnick
Nanostructures: fabrication and applications	X. Cheng
Nanophotonics: devices for manipulating light at the nanoscale	P. Dastmalchi; A. Haddadpour; G. Veronis
Nanodevices: fabrication, prospects for low dimensional devices and applications	T. Daniels-Race
Microfluidics: technologies and applications	L. Jiang; N.S. Korivi
Modeling of nanolithography processes	A. Isoyan; L.S. Melvin
Mask-substrate alignment via interferometric moiré fringes	E.E. Moon
Sidewall roughness in nanolithography: origins, metrology and device effects	V. Constantoudis; E. Gogolides; G.P. Patsis
New applications and emerging technologies in nanolithography	F. Yesilkoy; C. Ropp; Z. Cummins; R. Probst; E. Waks; B. Shapiro; M. Peckerar
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