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Home > Amorphous and nanocrystalline silicon science and technology--2004: Symposium held April 13-16, 2004, San Francisco, California, U. S. A. / > Metal induced crystallization of SiGe at 370[degrees]C for monolithically integrated MEMS applications
Amorphous and nanocrystalline silicon science and technology--2004: Symposium held April 13-16, 2004, San Francisco, California, U. S. A. / |
Abelson, John Robert.
Materials Research Society,
Amorphous and nanocrystalline silicon science and technology--2004: Symposium held April 13-16, 2004, San Francisco, California, U. S. A. /
Metal induced crystallization of SiGe at 370[degrees]C for monolithically integrated MEMS applications
Authors

Sherif Sedky, Kris Baert, Chris Van Hoof, Yi Wang, Omer Van Der Biest and Ann Witvrouw

ARI Id

1675866216479_53741906

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