"ANNEALING OF IMPLANTED LAYERS IN COMPOUND SEMICONDUCTORS BY LOCALIZED BEAM HEATING TECHNIQUES"

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Book	Author(s)	Year	Publisher
Compound Semiconductors Strained Layers and Devices	S. Jain; M. Willander; R. Overstraeten	2000	Springer US
Laser Annealing of Semiconductors	J. Poate	1982	Academic Press
Hydrogen in compound semiconductors	S. J. Pearton	1994	Trans Tech Publications
Handbook of Compound Semiconductors	Paul H. Holloway and Gary E. McGuire	1996	William Andrew Publishing
Compound Semiconductors 2002	Marc Ilegems; Gunter Weimann; Joachim Wagner	2003	Routledge
Compound Semiconductors 2001	Y Arakawa; Y. Hirayama; K Kishino; H Yamaguchi	2002	Routledge
Compound Semiconductors 1996	M S Shur; R A Suris	1997	Routledge
Electron Transport in Compound Semiconductors	B.R. Nag	1980	Springer Berlin Heidelberg
Compound Semiconductors 2004: Compound Semiconductors for Quantum Science and Nanostructures	J.C. Woo; H. Hasegawa; Y.S. Kwon; T. Yao; K.H. Yoo	2005	Routledge
Phosphorus-defect interactions during thermal annealing of ion implanted silicon	Patrick Henry Keys	2001
Heating and compression of thermonuclear targets by laser beam	N. G. Basov	1986	Cambridge University Press
Processing and Properties of Compound Semiconductors	R. Willardson; H.S. Nalwa	2001	Elsevier
Reliability and radiation effects in compound semiconductors	Allan Johnston	2010	World Scientific
Compound semiconductors: growth,processing,and devices	Paul H. Holloway; Timothy J. Anderson	1989	CRC Press
Einstein Relation in Compound Semiconductors and Their Nanostructures	Kamakhya Prasad Ghatak; Sitangshu Bhattacharya; Debashis De	2009	Springer Berlin Heidelberg
Effect of Disorder and Defects in Ion-Implanted Semiconductors: Optical and Photothermal Characterization	Constantinos Christofides; Gérard Ghibaudo	1997	Elsevier
CW Beam Processing of Silicon and Other Semiconductors	James F. Gibbons	1984	Elsevier
Compound Semiconductors 1999: Proceedings of the Twenty-Sixth International Symposium on Compound Semiconductors held in Berlin, Germany, 22–26 August 1999	K Ploog; Gunter Weimann	2000	Routledge
Compound Semiconductors 1998: Proceedings of the Twenty-Fifth International Symposium on Compound Semiconductors held in Nara, Japan, 12-16 October 1998	H Sakaki; J.C. Woo; N Yokoyama; Y Harayama	1999	Routledge
Compound semiconductors 1999: proceedings of the Twenty-sixth International Symposium on Compound Semiconductors held in Berlin, Germany, 22-26 August 1999 /	Ploog, Klaus,; Tränkle, G.,; Weimann, G.,		Taylor & Francis Group
Boook	Author(s)	Year	Publisher

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Chapter	Author(s)	Book	Book Authors	Year	Publisher
ANNEALING OF IMPLANTED LAYERS IN COMPOUND SEMICONDUCTORS BY LOCALIZED BEAM HEATING TECHNIQUES	C. Lawrence Anderson; H.L. Dunlap; L.D. Hess; G.L. Olson; K.V. Vaidyanathan	Laser and Electron Beam Processing of Materials	C.W. White	1980	Academic Press
Beam Annealing of Ion Implanted Silicon	James F. Gibbons	Process and Device Simulation for MOS-VLSI Circuits	P. Antognetti; D.A. Antoniadis; Robert W. Dutton; W.G. Oldham	1983	Springer Netherlands
Beam Annealing of Ion-Implanted Silicon	J. F. Gibbons	Ion Implantation: Equipment and Techniques: Proceedings of the Fourth International Conference Berchtesgaden, Fed. Rep. of Germany, September 13–17, 1982	Heiner Ryssel; Hans Glawischnig	1983	Springer Berlin Heidelberg
Beam Annealing of Ion-Implanted Silic		Ion Implantation: Equipment and Techniques: Proceedings of the Fourth International Conference Berchtesgaden, Fed. Rep. of Germany, September 13–17, 1982	P. R. Hanley (auth.), Dr. Heiner Ryssel, Dr. Hans Glawischnig (eds.)	1983	Springer-Verlag Berlin Heidelberg
CHARACTERIZATION OF IMPLANTED LAYERS AFTER LASER AND ELECTRON BEAM ANNEALING	G. G.Bentini; R. Galloni; P. G.Merli; L. Pedulli; I. Vecchi; F. Zignani	Laser and Electron Beam Processing of Materials	C.W. White	1980	Academic Press
Rapid Thermal Annealing of Ion Implanted Semiconductors	B. J. Sealy	Nuclear Physics Applications on Materials Science	E. Recknagel; J.C. Soares	1988	Springer Netherlands
Ion Beam Etching of Compound Semiconductors	G. A. Vawter	Handbook of Advanced Plasma Processing Techniques	R.J. Shul; S.J. Pearton	2000	Springer Berlin Heidelberg
Annealing of Defects in Ion-Implanted Layers by Pulsed Laser Radiation	G. A. Kachurin; V. A. Bogatyriov; S. I. Romanov; L. S. Smirnov	Ion Implantation in Semiconductors 1976	Fred Chernow	1977	Springer US
TRANSIENT ANNEALING OF IMPLANTED GaAs BY A PULSED ELECTRON BEAM	I. Golecki; M-A. Nicolet; M. Mäenpää; J.L. Tandon; C.G. Kirkpatrick; D.K. Sadana; J. Washburn	Laser and Electron Beam Processing of Materials	C.W. White	1980	Academic Press
OPTIMIZATION OF TWO WAVELENGTH LASER ANNEALING OF IMPLANTED SEMICONDUCTORS	M.C. Newstein; K.C. Liu; R. Kaplan	Laser and Electron Beam Processing of Materials	C.W. White	1980	Academic Press
ELECTRON BEAM ANNEALING OF ARSENIC IMPLANTED SILICON IN WINDOWS DEFINED BY OXIDE	J.M. Leas; P.J. Smith; A. Nagarajan; A. Leighton	Laser and Electron Beam Processing of Materials	C.W. White	1980	Academic Press
Diffusion of Impurities from Implanted Silicon Layers by Rapid Thermal Annealing	O. V. Aleksandrov; V. V. Kozlovskii; V. V. Popov; B. E. Samorukov	Volume 110, Number 2 December 16		1988	De Gruyter
HYDROGEN INCORPORATION IN PROTON-IMPLANTED ELEMENTAL AND COMPOUND SEMICONDUCTORS	C. Ascheron; D. Lehmann; C. Neelmeijer; A. Schindler	EPM ’89: 3rd International Conference on Energy Pulse and Particle Beam Modification of Materials, September 4. –8. 1989, Dresden, GDR	Karl Hohmuth; Edgar Richter	1989	De Gruyter
The Einstein Relation in Inversion Layers of Compound Semiconductors		Einstein Relation in Compound Semiconductors and Their Nanostructures	Kamakhya Prasad Ghatak; Sitangshu Bhattacharya; Debashis De	2009	Springer Berlin Heidelberg
Investigation of ion-implanted GaAs following electron-beam annealing	M A Shahid; S Moffatt; N J Barrett; B J Sealy	Microscopy of Semiconducting Materials, 1983	A.G. Cullis	1983	Routledge
CONTINUOUS ELECTRON BEAM ANNEALING OP ION-IMPLANTED SILICON	V.S Budishevsky; R. Grotzschel; V.A Kagadey; N.I. Lebedeva; D.I. Proskurovsky; E.B. Yankelevich	EPM 87. Energy Pulse and Particle Beam Modification of Materials: International Conference held September 7—11, 1987 Dresden, G. D. R.	Klaus Hennig	1988	De Gruyter
Localized Defects in Semiconductors	F. L. Vook; K. L. Brower	Computational Methods for Large Molecules and Localized States in Solids: Proceedings of a Symposium, Held May 15–17, 1972, at the IBM Research Laboratory, San Jose, California	Frank Herman; A. D. McLean; R. K. Nesbet	1973	Springer US
Compound Semiconductors	C. Hilsum	Electronic Materials	N. Bruce Hannay; Umberto Colombo	1973	Springer US
Compound Semiconductors		Laser and Electron Beam Processing of Materials	C.W. White	1980	Academic Press
Compound Semiconductors	J.S. WILLIAMS	Laser Annealing of Semiconductors	J. Poate	1982	Academic Press
Chapter	Author(s)	Book	Book Authors	Year	Publisher

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