"Limits to etch resistance for 193-nm single-layer resists"

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Book	Author(s)	Year	Publisher
Single transferable vote resists strategic voting	J. J. Bartholdi	1990	Sloan School of Management, Massachusetts Institute of Technology
Thermal modeling and analysis of 193 nm pulsed excimer laser calorimeters	Donghai Chen	2001
Single-layer wire routing and compaction	F. Miller Maley	1990	MIT Press
Debian Etch	Hertzog R., Mas R.	2007	Eyrolles
Resistance to Belief Change: Limits of Learning	Joseph R. Lao; Jason Young	2019	Routledge
Single-Shot 3D Sensing Close to Physical Limits and Information Limits	Florian Willomitzer	1st ed. 2019	Springer International Publishing
Narcissus Resists	Matthew Hittinger	February 18 2009	GOSS183
Polymers for microelectronics: resists and dielectrics	Larry F. Thompson; C. Grant Willson	1994	American Chemical Society
Radio Sets SCR-193-A SCR-193-B SCR-193-C SCR-193-D SCR-193-E	United States. War Department	1941	U.S. G.P.O.
Radio Sets SCR-193-A SCR-193-B SCR-193-C SCR-193-D SCR-193-E	United States. War Department	1941	U.S. G.P.O.
Single dimension, multiple development thin-layer chromatography of sugars for densitometric quantification	N. E. Martin	1975	Intermountain Forest and Range Experiment Station
Etch and blur: poems	Jamie Thomas	2012	Brick Road Poetry Press
Painted wood resists weathering	Forest Products Laboratory (U.S.)		Forest Products Laboratory, U. S. Forest Service
Band 193	Johannes Orth	1908	De Gruyter
Layer-by-Layer Films for Biomedical Applications	C. Picart; Jean-Claude Voegel; Frank Caruso; Gero Decher	2015	John Wiley & Sons
Freeze-Etch Histology: A Comparison between Thin Sections and Freeze-Etch Replicas	L. Orci; A. Perrelet	1975	Springer Berlin Heidelberg
Dynamics of Liquid Solidification: Thermal Resistance of Contact Layer	Zygmunt Lipnicki	1st ed. 2017	Springer International Publishing
Single to Single: Daily Devotions by and for Single Adults	Doug Fagerstrom; Douglas L. Fagerstrom	September 12, 2000	Kregel Publications
The growth of etch-figures.	William Harvey McNairn	1916	University Press
The growth of etch-figures	William Harvey McNairn	1916	University Press
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Limits to etch resistance for 193-nm single-layer resists	R. R. Kunz, S. C. Palmateer, A. R. Forte, R. D. Allen, G. M. Wallraff, R. A. DiPietro and D. C. Hofer	Advances in resist technology and processing XIII: 11-13 March 1996, Santa Clara, California /	Kunz, Roderick R.	[1996], ©1996.	International Society for Optical Engineering,
17. Progress in 193-nm Single Layer Resists: The Role of Photoacid Generator Structure on the Performance of Positive Resists	Robert D. Allen, Juliann Opitz and Carl E. Larson [et al.]	Micro- and nanopatterning polymers /	Ito, Hiroshi.	[1998], ©1998.	Distributed by Oxford University Press,
193-nm Lithography		Encyclopedia of Nanotechnology	Bharat Bhushan	2012	Springer Netherlands
193-nm Lithography		Encyclopedia of Nanotechnology	Bharat Bhushan	2nd ed. 2016	Springer Netherlands
Evaluation of cycloolefin-maleic anhydride alternating copolymers as single-layer photoresists for 193-nm photolithography	T. I. Wallow, F. M. Houlihan, O. Nalamasu, E. A. Chandross, T. X. Neenan and E. Reichmanis	Advances in resist technology and processing XIII: 11-13 March 1996, Santa Clara, California /	Kunz, Roderick R.	[1996], ©1996.	International Society for Optical Engineering,
Alicyclic Polymers for 193-nm Imaging		Encyclopedia of physical science and technology: polymers	Robert A. Meyers (editor)	2001	Academic Press
Protecting groups for 193-nm photoresists	R. D. Allen, R. Sooriyakumaran, J. Opitz, G. M. Wallraff, R. A. DiPietro, G. Breyta, D. C. Hofer, R. R. Kunz, S. Jayaraman, R. Shick, B. Goodall, U. Okoroanyanwu and C. G. Wilson	Advances in resist technology and processing XIII: 11-13 March 1996, Santa Clara, California /	Kunz, Roderick R.	[1996], ©1996.	International Society for Optical Engineering,
Single-Component Crosslinking Resists		Encyclopedia of physical science and technology: polymers	Robert A. Meyers (editor)	2001	Academic Press
Evalution of 193-nm alternating-aperture phase-shift mask dry etch processes	J. Plumhoff, C. Constantine, J. Shin, B. Reelfs, E. Rausa, J. M. Benz, M. S. Hibbs and T. A. Brunner	Photomask and next-generation lithography mask technology X: 16-18 April, 2003, Yokohama, Japan /	Tanabe, Hiroyoshi.	[2003], ©2003.	SPIE,
425 Etch stop layer (ESL)		Flexible Electronics, Volume 2: Thin-film transistors	Vinod Kumar Khanna	2019	Institute of Physics Publishing
193 Layer konvertieren		AutoCAD 2011 und LT 2011: Zeichnungen, 3D-Modelle, Layouts und Parametrik	Werner Sommer	2010	Markt+Technik Verlag
Bilayer resist approach for 193-nm lithography	U. P. Schaedeli, E. Tinguely, A. J. Blakeney, P. A. Falcigno and R. R. Kunz	Advances in resist technology and processing XIII: 11-13 March 1996, Santa Clara, California /	Kunz, Roderick R.	[1996], ©1996.	International Society for Optical Engineering,
The Limits to Resistance		The Nazi State and German society: a brief history with documents /	Moeller, Robert G.	c2010.	Bedford/St. Martin's,
Resistance Levels 193 to 196		45 Years in Wall Street / New Stock Trend Detector	GANN, W.D.	1949, 1936	Library of Gann Publishing Co. Inc.
193 Linear transition layer		Gravity Currents and Intrusions: Analysis and Prediction	Marius Ungarish	2020	World Scientific Pub Co Inc
193-nm excimer laser microstepper system	N. H. Rizvi, J. S. Cashmore and C. M. Solomon [et al.]	Microlithographic techniques in IC fabrication: 25-26 June, 1997, Singapore /	Yoon, Soon-Fatt.; Yu, Raymond.; Mack, Chris A.	[1997], ©1997.	SPIE,
193 VaR for a single asset		Paul Wilmott on Quantitative Finance	Paul Wilmott	2006	John Wiley & Sons Inc
Preparing to Etch	David Morrish; Marlene MacCallum	Copper Plate Photogravure: Demystifying the Process	David Morrish; Marlene MacCallum	2003	Routledge
193 Algebra of Limits		Wiley Problems in MATHEMATICS for JEE		2019	Wiley India Pvt Ltd.
Boundary-layer Resistance		Bryophyte Ecology (ver Jul 2020)	Janice M. Glime	2017
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